Journal
PLASMA PROCESSES AND POLYMERS
Volume 13, Issue 4, Pages 470-479Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.201500150
Keywords
dielectric barrier discharges (DBD); fluoropolymers; plasma-enhanced chemical vapor deposition (PECVD); polyurethane foam
Funding
- Italian Ministry for Education, University and Research (MIUR) [PON01_02239, PONa3_00369, PON02_00576_3333604]
- Regione Puglia [51]
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Thin films are deposited on open-cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C3F6). During deposition processes, a foam substrate is sandwiched between the dielectric-covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its three-dimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X-ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma-treated foams under all explored experimental conditions.
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