Porous cobalt hydroxide film electrodeposited on nickel foam with excellent electrochemical capacitive behavior

A new porous cobalt hydroxide film has been successfully electrodeposited on nickel foam from 0.1 M cobalt nitrate electrolyte at -1.0 V vs. SCE without adding any surfactant. The microstructure and surface morphology of prepared cobalt hydroxide films were physically characterized by X-ray diffraction analysis and scanning electron microscopy. The results indicate that an interlaced network structure was obtained. The effects of electrodeposition time, deposition potential, and different substrates on the specific capacitance and microstructure of prepared porous alpha-Co(OH)(2) thin film were systematically studied. The results indicate that the film deposited on nickel foam at -1.0 V has excellent electrochemical properties. A maximum specific capacitance of 1473 F g(-1) could be achieved at a current density of 2 A g(-1).