Journal
JOURNAL OF RAMAN SPECTROSCOPY
Volume 40, Issue 11, Pages 1634-1640Publisher
WILEY
DOI: 10.1002/jrs.2311
Keywords
polyhedral oligomeric silsesquioxane; dimethacrylates; Raman spectroscopy; XPS; DMA
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The kinetic behavior of the urethane dimethacrylate (UDMA) copolymerized and reinforced by different concentrations of polyhedral oligomeric silsesquioxane (POSS) with methacrylic groups was studied through Raman spectroscopy. UDMA-POSS networks have been synthesized with three different types of POSS, two moncifunctional POSS (1-propylmethacrylate)-heptaisobutyl substituted (HISO-POSS) and heptacyclopentyl-octasiloxan-1-yloxy) dimethylsilyl] propyl methacrylate (CPENTYL-POSS) and one octafunctional POSS-methacryl substituted (MA-POSS). In order to show the influence of POSS on the final conversion, the hybrid systems were cured using three types of initiators which decompose at different temperatures: azobisisobutyronitrile (AIBN) (65 degrees C), benzoyl peroxide (BP) (80 degrees C) and di-tert-butyl peroxide (DTBP) (120 degrees C). The structure of the hybrid's surface was investigated by X-ray photoelectron spectroscopy (XPS) and the T-g values were calculated from dynamic mechanical analysis (DMA) tests. Copyright (C) 2009 John Wiley & Sons, Ltd.
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