Journal
JOURNAL OF POWER SOURCES
Volume 199, Issue -, Pages 413-417Publisher
ELSEVIER
DOI: 10.1016/j.jpowsour.2011.10.065
Keywords
Nickel oxide; Electrochemical capacitor; Porous film
Funding
- China Postdoctoral Science Foundation [20100481401]
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A hierarchically porous NiO film on nickel foam substrate is prepared by a facile ammonia-evaporation method. The self-assembled film possesses a structure consisting of NiO triangular prisms and randomly porous NiO nanoflakes. The pseudocapacitive behaviors of the porous NiO film are investigated by cyclic voltammograms and galvanostatic charge-discharge tests in 1 M KOH. The hierarchically porous NiO film exhibits a high discharge capacitance and excellent rate capability with 232 F g(-1), 229 F g(-1), 213 F g(-1) and 200 F g(-1) at 2, 4, 10, and 20 A g(-1), respectively. The specific capacitance of 87% is maintained from 2 A g(-1) to 20 A g(-1). The porous NiO film also shows rather good cycling stability and exhibits a specific capacitance of 348 F g(-1) after 4000 cycles. (C) 2011 Elsevier B.V. All rights reserved.
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