Journal
JOURNAL OF POWER SOURCES
Volume 190, Issue 2, Pages 307-310Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jpowsour.2009.01.090
Keywords
Cathode; LSCF; Sputtering; Thin film; SOFC
Funding
- U.S. Department of Energy SECA core technology [DE-NT-0006557]
- National Research Foundation of Korea [과C6A2003] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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Thin films of La0.6Sr0.4Co0.2Fe0.8O3-delta (LSCF) were deposited on (100) silicon and on GDC electrolyte substrates by rf-magnetron sputtering using a single-phase oxide target of LSCF. The conditions for sputtering were systematically studied to get dense and uniform films, including substrate temperature (23-600 C) background pressure (1.2 x 10(-2) to 3.0 x 10(-2) mbar), power, and deposition time. Results indicate that to produce a dense, uniform, and crack-free LSCF film, the best substrate temperature is 23 C and the argon pressure is 2.5 x 10(-2) mbar. Further, the electrochemical properties of a dense LSCF film were also determined in a cell consisting of a dense LSCF film (as working electrode), a GDC electrolyte membrane. and a porous LSCF counter electrode. Successful fabrication of high quality (dense and uniform) LSCF films with control of thickness, morphology, and crystallinity is vital to fundamental studies of cathode materials for solid oxide fuel cells. (c) 2009 Elsevier B.V. All rights reserved.
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