Journal
JOURNAL OF POWER SOURCES
Volume 180, Issue 1, Pages 576-581Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jpowsour.2008.02.049
Keywords
LiMn2O4 thin film; radio frequency magnetron sputtering; chemical diffusion coefficient; cyclic voltammetry; potentiostatic intermittent titration technique; electrochemical impedance spectroscopy
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LiMn2O4 thin films were deposited on silica glass substrates by radio frequency (RF) magnetron sputtering. The films were characterized by X-ray diffraction (XRD) and scanning electron microscope (SEM). Li-ion chemical diffusion coefficients (D) over tilde (Li) were measured by cyclic voltammetry (CV), potentiostatic intermittent titration technique (PITT), electrochemical impedance spectroscopy (EIS) and limiting current density (LCD). The (D) over tilde (Li) values depended on the content of Li in LixMn2O4. It was found that the (D) over tilde (Li) values by CV, PITT and LCD were in the order of 10(-10), 10(-11) and 10(-12) cm(2) s(-1), respectively, and those by EIS were in the range of 10(-9) to 10(-11) cm(2) s(-1). The (D) over tilde (Li) values obtained by above methods were compared with those by an electron blocking method. It turned out that the (D) over tilde (Li) values by the electron blocking method were more comparable with those by EIS. (C) 2008 Elsevier B.V. All rights reserved.
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