Journal
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY
Volume 53, Issue 2, Pages 344-352Publisher
WILEY
DOI: 10.1002/pola.27370
Keywords
block copolymers; interaction parameter; lithography; reactive ion etching; self-assembly
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Funding
- Nissan Chemical Company
- ASTC
- Rashid Engineering Regents Chair
- National Science Foundation Scalable Nanomanufacturing Program [1120823]
- IBM Ph.D. Fellowship Program
- Endowed Graduate Fellowship in Engineering
- Virginia Fellowship in Engineering
- Ernest Cockrell, Jr. Fellowship in Engineering
- Welch Foundation [F-1709]
- Directorate For Engineering
- Div Of Electrical, Commun & Cyber Sys [1120823] Funding Source: National Science Foundation
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This report describes the design and synthesis of a series of lamella-forming, silicon-containing block copolymers (Si-BCPs) and evaluation of these materials as potential candidates for lithographic applications. The interaction parameter of each Si-BCP is measured by both the mean-field theory predicted order-disorder transition and by analysis of X-ray scattering profiles. The introduction of more-polar methoxy and less-polar methylsilyl moieties increases to about 2-3 times that of the reference material, poly(styrene-block-4-trimethylsilylstyrene). The incremental increases appear to be essentially additive in this family of block copolymers, suggesting that improvements in can be predicted from appropriate monomer choice. Perpendicularly oriented thin-films of the ordered Si-BCPs generated by thermally annealing between two neutral polymeric surfaces and developed by etching on commercial RIE equipment show excellent image fidelity. These images demonstrate the excellent etch contrast of the Si-BCPs and document improvements in pattern fidelity that are realized with more strongly segregated BCPs. (c) 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015, 53, 344-352
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