Related references
Note: Only part of the references are listed.Enhanced growth of high quality single crystal diamond by microwave plasma assisted chemical vapor deposition at high gas pressures
Qi Liang et al.
APPLIED PHYSICS LETTERS (2009)
The role of inert gas in MW-enhanced plasmas for the deposition of nanocrystalline diamond thin films
O. J. L. Fox et al.
DIAMOND AND RELATED MATERIALS (2009)
Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition
Jie Ma et al.
JOURNAL OF APPLIED PHYSICS (2009)
The CVD of nanodiamond materials
James E. Butler et al.
CHEMICAL VAPOR DEPOSITION (2008)
New insights into the mechanism of CVD diamond growth: Single crystal diamond in MW PECVD reactors
Yu. A. Mankelevich et al.
DIAMOND AND RELATED MATERIALS (2008)
Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures
Yuri A. Mankelevich et al.
JOURNAL OF APPLIED PHYSICS (2008)
Probing the plasma chemistry in a microwave reactor used for diamond chemical vapor deposition by cavity ring down spectroscopy
Jie Ma et al.
JOURNAL OF APPLIED PHYSICS (2008)
Geometric modeling of homoepitaxial CVD diamond growth: I. The {100}{111}{110}{113} system
F. Silva et al.
JOURNAL OF CRYSTAL GROWTH (2008)
Studies of Carbon Incorporation on the Diamond {100} Surface during Chemical Vapor Deposition using Density Functional Theory
Andrew Cheesman et al.
JOURNAL OF PHYSICAL CHEMISTRY A (2008)
From ultrananocrystalline diamond to single crystal diamond growth in hot filament and microwave plasma-enhanced CVD reactors: a unified model for growth rates and grain sizes
Paul W. May et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2008)
A mechanism for crystal twinning in the growth of diamond by chemical vapour deposition
James E. Butler et al.
PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES (2008)
Measurement and modeling of Ar/H2/CH4 arc jet discharge chemical vapor deposition reactors II:: Modeling of the spatial dependence of expanded plasma parameters and species number densities
Yu. A. Mankelevich et al.
JOURNAL OF APPLIED PHYSICS (2007)
Simplified description of microwave plasma discharge for chemical vapor deposition of diamond
Hideaki Yamada et al.
JOURNAL OF APPLIED PHYSICS (2007)
Microcrystalline, nanocrystalline, and ultrananocrystalline diamond chemical vapor deposition: Experiment and modeling of the factors controlling growth rate, nucleation, and crystal size
P. W. May et al.
JOURNAL OF APPLIED PHYSICS (2007)
Improved flow conditions in diamond hot filament CVD -: Promising deposition results and gas phase characterization by laser absorption spectroscopy
J. Hirmke et al.
VACUUM (2007)
Investigation of the effect of the total pressure and methane concentration on the growth rate and quality of diamond thin films grown by MPCVD
Xianglin Li et al.
DIAMOND AND RELATED MATERIALS (2006)
Growth and properties of nanocrystalline diamond films
Oliver A. Williams et al.
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE (2006)
Thick single crystal CVD diamond prepared from CH4-rich mixtures
G. Bogdan et al.
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE (2006)
Multiple growth and characterization of thick diamond single crystals using chemical vapour deposition working in pulsed mode
A. Tallaire et al.
JOURNAL OF CRYSTAL GROWTH (2006)
Reevaluation of the mechanism for ultrananocrystalline diamond deposition from Ar/CH4/H2 gas mixtures
PW May et al.
JOURNAL OF APPLIED PHYSICS (2006)
Comparison of MWPCVD diamond growth at low and high process gas pressures
H. Sternschulte et al.
DIAMOND AND RELATED MATERIALS (2006)
Application of a quantum cascade laser for time-resolved, in situ probing of CH4/H2 and C2H2/H2 gas mixtures during microwave plasma enhanced chemical vapor deposition of diamond
A Cheesman et al.
JOURNAL OF PHYSICAL CHEMISTRY A (2006)
The state of the art in the growth of diamond crystals and films
V. P. Varnin et al.
INORGANIC MATERIALS (2006)
Kinetic Monte Carlo simulations of CVD diamond growth - Interlay among growth, etching, and migration
A Netto et al.
DIAMOND AND RELATED MATERIALS (2005)
Growth and characterization of near-atomically flat, thick homoepitaxial CVD diamond films
G Bogdan et al.
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE (2005)
Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition -: art. no. 053303
G Lombardi et al.
JOURNAL OF APPLIED PHYSICS (2005)
The role of C2 in nanocrystalline diamond growth
JR Rabeau et al.
JOURNAL OF APPLIED PHYSICS (2004)
Spectroscopic diagnostics and modeling of Ar/H2/CH4 microwave discharges used for nanocrystalline diamond deposition
G Lombardi et al.
JOURNAL OF APPLIED PHYSICS (2004)
Atomic-scale visualization and surface electronic structure of the hydrogenated diamond C(100)-(2x1):H surface -: art. no. 195416
K Bobrov et al.
PHYSICAL REVIEW B (2003)
Atomic-scale desorption of hydrogen from hydrogenated diamond surfaces using the STM
K Bobrov et al.
SURFACE SCIENCE (2003)
The HITRAN molecular spectroscopic database: edition of 2000 including updates through 2001
LS Rothman et al.
JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER (2003)
Gem-quality synthetic diamonds grown by a chemical vapor deposition (CVD) method
WY Wang et al.
GEMS & GEMOLOGY (2003)
Very high growth rate chemical vapor deposition of single-crystal diamond
CS Yan et al.
PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA (2002)
Effects of NH3 and N2 additions to hot filament activated CH4/H2 gas mixtures
JA Smith et al.
JOURNAL OF APPLIED PHYSICS (2002)
The cavity ring-down spectroscopy of C-2 in a microwave plasma
P John et al.
DIAMOND AND RELATED MATERIALS (2002)
On the mechanism of CH3 radical formation in hot filament activated CH4/H2 and C2H2/H2 gas mixtures
JA Smith et al.
DIAMOND AND RELATED MATERIALS (2001)
Experimental data vs. 3-D model calculations of HFCVD processes: correlations and discrepancies
YA Mankelevich et al.
DIAMOND AND RELATED MATERIALS (2001)
Numerical modeling of a microwave plasma CVD reactor
AM Gorbachev et al.
DIAMOND AND RELATED MATERIALS (2001)
Unravelling aspects of the gas phase chemistry involved in diamond chemical vapour deposition
MNR Ashfold et al.
PHYSICAL CHEMISTRY CHEMICAL PHYSICS (2001)
Multi-length scale modeling of CVD of diamond - Part II - A combined atomic-scale/grain-scale analysis
M Grujicic et al.
JOURNAL OF MATERIALS SCIENCE (2000)
Microstructure evolution in diamond CVD: Computer simulations of 111 surface site formation on a growing diamond-100 surface
RC Brown et al.
JOURNAL OF PHYSICAL CHEMISTRY B (2000)
Methyl concentration measurements during microwave plasma-assisted diamond deposition
MA Cappelli et al.
PLASMA CHEMISTRY AND PLASMA PROCESSING (2000)
Diamond thin films: a 21st-century material
PW May
PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES (2000)