Journal
JOURNAL OF PHYSICS-CONDENSED MATTER
Volume 21, Issue 36, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0953-8984/21/36/364201
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Funding
- ONR/NRL
- EPSRC
- Element Six Ltd
- University of Bristol
- Overseas Research Scholarship (ORS)
- RF Government for Key Science Schools [133.2008.2]
- Royal Society Joint Project
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In this paper we review and provide an overview to the understanding of the chemical vapor deposition (CVD) of diamond materials with a particular focus on the commonly used microwave plasma-activated chemical vapor deposition (MPCVD). The major topics covered are experimental measurements in situ to diamond CVD reactors, and MPCVD in particular, coupled with models of the gas phase chemical and plasma kinetics to provide insight into the distribution of critical chemical species throughout the reactor, followed by a discussion of the surface chemical process involved in diamond growth.
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