Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 46, Issue 17, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/46/17/175004
Keywords
-
Categories
Funding
- Element Science and Technology Project
- MEXT of Japan
Ask authors/readers for more resources
A selective method for growing high-quality spinel-type epitaxial Fe3O4(0 0 1) or gamma-Fe2O3(0 0 1) films was developed using conventional planar-type sputtering by controlling the flow rate of oxygen gas (phi(O2)). Although magnetization of the oxide films is close to that of Fe3O4 or gamma-Fe2O3 for all phi(O2), the room-temperature resistivity and the Fe3+ and Fe2.5+ composition ratios of the films are dependent on phi(O2). The films for 0.2 <= phi(O2) <= 0.5 sccm and phi(O2) >= 0.7 sccm are identified as Fe3O4 and gamma-Fe2O3 films, respectively. All the results suggest that Fe2O3 films are obtained only when sputtered in the metal mode, and gamma-Fe2O3 films are obtained in the oxide mode.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available