Journal
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS
Volume 75, Issue 4, Pages 500-504Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.jpcs.2013.12.013
Keywords
A. Thin film; B. Epitaxial growth; D. Surface properties
Funding
- Australian Research Council
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This paper investigates the dependence of surface undulation on a film thickness considerably greater than the critical value of a thin film system. It considers that surface tension and residual stress are the main cause of surface undulation. The study found that there is a critical undulation wavelength that minimizes the free energy of a thin film system, that this critical wavelength depends on the film thickness, and the effect of undulation amplitude is insignificant. The research also found that the surface undulation has a negligible influence on the residual stresses in the thin film system. (C) 2013 Elsevier Ltd. All rights reserved.
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