Journal
JOURNAL OF PHYSICAL CHEMISTRY LETTERS
Volume 4, Issue 23, Pages 4188-4191Publisher
AMER CHEMICAL SOC
DOI: 10.1021/jz4022415
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- Office of Science of the U.S Department of Energy [DE-SC0004993]
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Atomic-layer deposition (ALD) of thin layers of cobalt oxide on n-type BiVO4 produced photoanodes capable of water oxidation with essentially 100% faradaic efficiency in alkaline, pH = 13 electrolytes. By contrast, under the same operating conditions, BiVO4 photoanodes without the Co oxide catalytic layer exhibited lower faradaic yields, of ca. 70%, for O-2 evolution and were unstable, becoming rapidly photopassivated. High numbers (>25) of ALD cycles of Co oxide deposition gave electrodes that displayed poor photo-electrochemical behavior, but 15-20 ALD cycles produced Co oxide overlayers similar to 1 nm in thickness, with the resulting photoelectrodes exhibiting a stable photocurrent density of 1.49 rnA cm(-2) at the oxygen-evolution potential and an open-circuit potential of 0.404 V versus the reversible hydrogen electrode, under 100 mW cm(-2) of simulated air mass 1.5 illumination.
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