Zr2O3 Nanostripes on TiO2(110) Prepared by UHV Chemical Vapor Deposition

Zirconium tetra-tert-butoxide was used as precursor for the growth of ZrO2 films on TiO2(110) in ultrahigh vacuum conditions. The composition of the film was characterized by X-ray photoelectron spectroscopy (XPS), while its thickness and growth mode were characterized by angle-resolved photoelectron spectroscopy (AR-XPS). The structure of the interface was studied in detail by angle-scanned X-ray photoelectron diffraction (AS-XPD). These data, compared with multiple-scattering spherical wave (MSSW) simulations suggest the growth, at the interface, of Zr2O3 nanostripes aligned along the [001] direction. The structure and composition of the interface are responsible for the lower acidity of the ZrO2/TiO2(110) surface if compared with that of the bare substrate.