Journal
JOURNAL OF PHYSICAL CHEMISTRY C
Volume 117, Issue 20, Pages 10755-10763Publisher
AMER CHEMICAL SOC
DOI: 10.1021/jp400996s
Keywords
-
Funding
- Global COE Program Global Center of Excellence for Mechanical Systems Innovation
- Nanotechnology Platform [12024046]
- Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan
- [22226006]
- [23760179]
- [23760180]
- Grants-in-Aid for Scientific Research [25106003, 23760180, 22226006] Funding Source: KAKEN
Ask authors/readers for more resources
Using low-pressure chemical vapor deposition (LPCVD), we, for the first time, realize the self-limiting growth behavior of monolayer graphene on commercially available electroplated copper foils from a carbon precursor other than methane, and systematically investigate the growth of graphene from ethanol and compare its self-limiting behavior over copper facets with different identities. Results show that the growth of graphene from ethanol in the LPCVD process is a substra-temediated process, in which the domains of graphene are determined by the lattice axes on the copper facets. Moreover, during the evolution of the domains, low-index copper facets of Cu(111) and Cu(100) play a critical role in the following self-limiting process of a continuous graphene sheet, whereas the Cu(110) and high-index facets favor nucleation and formation of secondary layers. In addition, a high degree of similarity exists between graphene grown from ethanol and methane, showing that, when the carbon flux is sufficiently low, the self-limiting growth of graphene on copper surfaces using LPCVD is independent of the precursor structure of ethanol and methane.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available