4.6 Article

Nucleation Mechanism of Electrochemical Deposition of Cu on Reduced Graphene Oxide Electrodes

Journal

JOURNAL OF PHYSICAL CHEMISTRY C
Volume 115, Issue 32, Pages 15973-15979

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/jp201667p

Keywords

-

Funding

  1. MOE [MOE2010-T2-1-060]
  2. NTU in Singapore [M58120031]

Ask authors/readers for more resources

The nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide (rGO) electrodes has been systematically studied on the basis of the cyclic voltammetry, Tafel plot, and chronoamperometry. Our results show that the experimental parameters including electrolyte concentration, deposition potential, solution pH, and the presence of background electrolyte can determine the nucleation mechanism. Scanning electron microscopy is employed to study the nucleation and growth of Cu on rGO electrodes. This study is significant in development of the electrochemical method in practical applications based on the rGO electrodes.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available