Journal
JOURNAL OF PHYSICAL CHEMISTRY C
Volume 114, Issue 5, Pages 2256-2266Publisher
AMER CHEMICAL SOC
DOI: 10.1021/jp909876t
Keywords
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Funding
- National Science Foundation [CHE-0431425]
- U.S. Department of Energy [DE-AC02-05CH11231]
- Alexander-von-Humboldt foundation
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We have investigated hydroxylation and water adsorption on alpha-Fe2O3(0001) at water vapor pressures up to 2 Torr and temperatures ranging from 277 to 647 K (relative humidity (RH) <= 34%) using ambient-pressure X-ray photoelectron spectroscopy (XPS). Hydroxylation occurs at the very low RH of 1 x 10(-7) % and precedes the adsorption of molecular water. With increasing RH, the OH coverage increases up to one monolayer (ML) without any distinct threshold pressure. Depth profiling measurements showed that hydroxylation occurs only at the topmost Surface under our experimental conditions. The onset of molecular water adsorption varies from similar to 2 x 10(-5) to similar to 4 x 10(-2) % RH depending on sample temperature and water vapor pressure. The coverage of water reaches 1 ML at similar to 15% RH and increases to 1.5 ML at 34% RH.
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