Effects of a TiO2 Buffer Layer on Solution-Deposited VO2 Films: Enhanced Oxidization Durability

In this article, thermochromic VO2 films were deposited on fused quartz and rutile TiO2-buffered fused quartz substrates via a solution-phase process. The incorporation of a TiO2 buffer layer endures an enhanced oxidization durability of VO2 films under an environment with high oxygen partial pressures. Oxidization in furnace during a cooling stage and rapid thermal oxidization (RTO) treatments were employed to investigate the evolution of microstructures and compositions of the films in the gradual oxidization processes. Oxidization treatments transformed VO2 into V2O5 for films grown on fused quartz substrates, whereas the oxidation process was significantly hindered for films prepared on a TiO2 buffer layer, especially around the VO2/TiO2 interface. The phenomenon is first reported in this article and is important for practical applications.