4.5 Article

Sulfur doping of AlN and AlGaN for improved n-type conductivity

Journal

PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
Volume 9, Issue 8, Pages 462-465

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssr.201510165

Keywords

GaN; doping; first-principles calculations; AlGaN; electrical conductivity

Funding

  1. Center for Low Energy Systems Technology (LEAST)
  2. one of six SRC STARnet Centers - MARCO
  3. DARPA
  4. NSF [DMR-1434854]
  5. ONR Dielectric Enhancements for Innovative Electronics MultidisciplinaryUniversity Initiative [N00014-10-1-0937]
  6. U.S. Department of Energy at Lawrence Livermore National Laboratory [DE-AC52-07NA27344]
  7. Office of Science of the U.S. Department of Energy [DE-AC02-05CH11231]
  8. Direct For Mathematical & Physical Scien [1434854] Funding Source: National Science Foundation
  9. Division Of Materials Research [1434854] Funding Source: National Science Foundation

Ask authors/readers for more resources

Achieving high levels of n-type conductivity in AlN and high Al-content nitride alloys is a long standing problem; significant decreases in conductivity are observed as the Al content is increased, a phenomenon that has been attributed to donors such as oxygen or silicon forming DX centers. We address this problem through a comprehensive first-principles hybrid density functional study of potential n-type dopants, identifying SN and SeN as two elements which are potential shallow donors because they do not undergo a DX transition. In particular, SN is highly promising as an n-type dopant because it also has a low formation energy and hence a high solubility. (C) 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

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