4.5 Article

Effects of annealing on structure and composition of LSMO thin films

Journal

PHYSICA B-CONDENSED MATTER
Volume 477, Issue -, Pages 14-19

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.physb.2015.07.032

Keywords

LSMO; LaMnOx; Magnetron sputtering; Annealing; Structure; XPS

Funding

  1. National Natural Science Foundation of China [11304398, 11334014, 51173205]
  2. CSU [2014ZZTS011]
  3. CSU
  4. NSF [DMR-1303742]
  5. Division Of Materials Research
  6. Direct For Mathematical & Physical Scien [1303742] Funding Source: National Science Foundation

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The effects of annealing on structure and composition of LSMO thin films grown by the means of DC magnetron sputtering have been investigated with the assistance of X-ray diffraction (XRD), atomic force microscopy (AFM) and X-ray photoemission spectroscopy (XPS). The first LSMO-related diffraction peak (A) appears on the sample prepared at 1023 K and shifts toward low-angle direction at higher temperature. A new diffraction peak (B) related to LaMnO, is observed on the sample prepared at 1073 K that becomes stronger with increasing annealing temperature. AFM images display the corresponding morphology evolutions. XPS results reveal that LaMnO, is formed clue to strontium segregation on the LSMO surface at a temperature higher than 1023 K. Meanwhile, we find that a new ingredient appears from 973 to 1023 K and disappears from 1073 K to 1123 K. which is predicted to exist as semiconductor or insulator on the surface. (C) 2015 Elsevier B.V. All rights reserved.

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