4.2 Article

Photocatalytic Activity of Metal-Inserted WO3 Thin Films Prepared by RF Magnetron Sputtering

Journal

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume 13, Issue 10, Pages 7053-7055

Publisher

AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2013.7733

Keywords

RF Magnetron Sputtering; Tungsten Oxide Thin Film; Photocatalytic Activity

Funding

  1. University of Ulsan

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Metal (Au,Pt)-inserted WO3 thin films were deposited on quartz glass using a radio frequency magnetron sputtering method. Their structural and optical properties were analyzed by scanning electron microscopy, X-ray diffractometry, absorption spectrometry, and photoluminescence spectrometry. The photocatalytic activities of the films were investigated by the measurement of photodecomposition of methylene blue under visible-ray irradiation. Metal-inserted WO3 films showed higher photocatalytic activity than WO3 film. Pt-inserted WO3 thin film showed the most effective decomposition efficiency, it is due to the high absorption and the suppression of recombination between photo-excited electrons and holes.

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