4.2 Article Proceedings Paper

Fire-Through Ag Contact Formation for Crystalline Si Solar Cells Using Single-Step Inkjet Printing

Journal

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume 12, Issue 4, Pages 3620-3623

Publisher

AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2012.5574

Keywords

Fire-Through Contact; Inkjet Printing; Additives; Si Solar Cell

Funding

  1. National Research Foundation of Korea (NRF) [2010-0014480]
  2. Korea government (MEST)
  3. New and Renewable Energy of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) [2008-N-PV08-P-09-0-000]
  4. Korea Evaluation Institute of Industrial Technology (KEIT) [2008-N-PV08-P-09] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  5. National Research Foundation of Korea [2010-0014480] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Inkjet-printed Ag metallization is a promising method of forming front-side contacts on Si solar cells due to its non-contact printing nature and fine grid resolution. However, conventional Ag inks are unable to punch through the SiNx anti-reflection coating (ARC) layer on emitter Si surfaces. In this study, a novel formulation of Ag ink is examined for the formation of fire-through contacts on a SiNx-coated Si substrate using the single-step printing of Ag ink, followed by rapid thermal annealing at 800 degrees C. In order to formulate Ag inks with fire-through contact formation capabilities, a liquid etching agent was first formulated by dissolving metal nitrates in an organic solvent and then mixing the resulting solution with a commercial Ag nanoparticle ink at various volume ratios. During the firing process, the dissolved metal nitrates decomposed into metal oxides and acted in a similar manner to the glass frit contained in Ag pastes for screen-printed Ag metallization. The newly formulated ink with a 1 wt% loading ratio of metal oxides to Ag formed finely distributed Ag crystallites on the Si substrate after firing at 800 degrees C for 1 min.

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