Journal
JOURNAL OF NANOPARTICLE RESEARCH
Volume 12, Issue 3, Pages 931-938Publisher
SPRINGER
DOI: 10.1007/s11051-009-9643-9
Keywords
Flexible electronics; Polymer; Laser direct writing; Nanometal ink; Micropatterns; Resistivity; Nanomanufacturing
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Funding
- New Energy and Industrial Technology Development Organization (NEDO) of Japan
- Ministry of Education, Science and Culture of Japan
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This article describes fabrication of Ag micropatterns on a flexible polyimide (PI) film by laser direct writing using an Ag nanoparticle-dispersed film as a precursor. Ag micropatterns are characterized by optical microscopy, atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM), surface profilometry, and resistivity measurements. The line width of Ag micropatterns can be effectively controlled by altering the experimental parameters of laser direct writing especially laser intensity, objective lens, and laser beam scanning speed etc. Using an objective lens of 100x and laser intensity of 170.50 kW/cm(2), Ag micropatterns with a line width of about 6 mu m have been achieved. The Ag micropatterns show strong adhesion to polyimide surface as evaluated by Scotch-tape test. The resistivity of the Ag micropatterns is determined to be 4.1 x 10(-6) Omega cm using two-point probe method. This value is comparable with the resistivity of bulk Ag (1.6 x 10(-6) Omega cm).
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