Journal
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
Volume 22, Issue 5, Pages 1073-1080Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JMEMS.2013.2264729
Keywords
PDMS; superhydrophobicity; underexposure; underbaking
Categories
Funding
- State of Texas Emerging Technology Fund FUSION
- WCU [R32-2009-000-20087-0]
- National Research Foundation of Korea [2012R1A2A2A01014711]
- Korean government (MEST)
- National Research Foundation of Korea [2012R1A2A2A01014711] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Ask authors/readers for more resources
We report an extremely simple method of making an optically transparent superhydrophobic polydimethyl-siloxane (PDMS) thin film using underexposed and underbaked positive photoresist (PR) mold. Significant under soft-bake condition makes PR retain good amount of solvents, which greatly increases the dissolution rate of the PR during developing. A combination of optimal underbaking and underexposure condition created a unique hierarchical micro-/nano- structure on the PR mold, and inverse image of the PR mold was replicated to create a hierarchical micro/nano structured broccoli-shaped PDMS thin film. A 100-nm-thick fluorocarbon film was optionally deposited on the broccoli-shaped PDMS film to further enhance superhydrophobicity. Advancing and receding angles of the film for 4-mu L water droplet were found to be 161.33 +/- 0.763 degrees and 133.33 +/- 0.29 degrees, respectively, showing superhydrophobicity. It was also found that the optical transmittance at around 550 nm for this PDMS film was approximately 90%. [2012-0381]
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available