Journal
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
Volume 13, Issue 2, Pages -Publisher
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
DOI: 10.1117/1.JMM.13.2.023007
Keywords
plasmonic crystals; plasmonic resonance; photoluminescence enhancement; nanoimprint lithography; large-area fabrication
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Funding
- Japanese Ministry of Education, Culture, Sports, Science and Technology [22109007]
- NanoIntegration Foundry, Low Carbon Research Network in NIMS
- HPCI System Research Project, Japan [hp120066]
- Grants-in-Aid for Scientific Research [26706020, 22109007] Funding Source: KAKEN
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We fabricated large-area stacked complementary plasmonic crystals (SC PlCs) by employing ultraviolet nanoimprint lithography. The SC PlCs were made on silicon-on-insulator substrates consisting of three layers: the top layer contacting air was a perforated Au film, the bottom layer contacting the buried oxide layer included an Au disk array corresponding to the holes in the top layer, and the middle layer was a Si photonic crystal slab. The SC PlCs have prominent resonances in optical wavelengths. It is shown that the fabricated PlCs were precise in structure and uniform in their optical properties. We examined the photoluminescence (PL) enhancement of monolayer dye molecules on the SC PlC substrates in the visible range and found large PL enhancements of up to a 100-fold in comparison with dye molecules on nonprocessed Si wafers. (C) The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
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