Journal
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
Volume 8, Issue 4, Pages -Publisher
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
DOI: 10.1117/1.3258487
Keywords
microring resonator; fabrication; waveguide; roughness
Categories
Funding
- National Basic Research Program of China [2006CB708310]
- Natural Science Foundation of China [60578048]
- CNRS
Ask authors/readers for more resources
Fabrication of silicon microring resonators was optimized by using electron-beam lithography (EBL) and inductively coupled plasma (ICP) etching with different mask materials. Sidewall roughness of less than 10 nm was revealed by high-resolution scanning electron microscopy (SEM) without any post-etch process. The fabrication processes are described in detail, and comparisons are made in consideration of process complexity, process latitude, and sidewall roughness. (C) 2009 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.3258487]
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available