Journal
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 20, Issue -, Pages 303-306Publisher
SPRINGER
DOI: 10.1007/s10854-008-9595-3
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Raman spectroscopy (RS) was used to study the phase transformations of nanocrytalline TiO2 thin films. The films were grown by a vertical-flow cold-wall metal organic chemical vapour deposition system, using Ti(C10H14O5) as the source reagent, at different substrate temperatures. The results indicate that the anatase phase is present at around 550 A degrees C and the rutile phase starts to form at 620 A degrees C. The anatase phase completely transforms into the rutile phase at 680 A degrees C. We have demonstrated that RS can be used as a powerful nondestructive technique for a quick and efficient determination of the phase of TiO2 thin films.
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