Journal
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 20, Issue 10, Pages 953-957Publisher
SPRINGER
DOI: 10.1007/s10854-008-9819-6
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Thin nickel oxide (NiO) films were deposited by the electron beam evaporation technique. The films were post annealed in air at 450-500 A degrees C for 5 h and the effect of annealing on the structural, microstructural, electrical and optical properties were studied. X-ray diffraction studies indicated the polycrystalline nature of the films. The microstructural parameters were evaluated. The band gap of the films was found to be about 3.60 eV. Electrical resistivity of the films was 4.5 x 10(-4) Omega cm. FTIR studies indicated a broad spectrum centered at 461.6 cm(-1). Cyclic voltammetry studies in 1 M KOH solution revealed good electronic electrochromic behaviour.
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