4.6 Review

Plasma-based processes and thin film equipment for nano-scale device fabrication

Related references

Note: Only part of the references are listed.
Article Materials Science, Coatings & Films

Differential etching behavior between semi-insulating and n-doped 4H-SiC in high-density SF6/O2 inductively coupled plasma

Naoya Okamoto

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2009)