Journal
JOURNAL OF MATERIALS RESEARCH
Volume 28, Issue 1, Pages 129-135Publisher
CAMBRIDGE UNIV PRESS
DOI: 10.1557/jmr.2012.224
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To understand the impact that the growth rate has on the residual stress of chemical vapor deposition-grown 3C-SiC heteroepitaxial films on Si substrates, growth experiments were performed. The film thickness was held constant at similar to 2.5 mu m independent of the growth rate so as to allow for direct film comparison as a function of the growth rate. Stress analysis performed by profilometer curvature measurement, mu l chi rho o-Raman shift analysis and micro-machined freestanding structures, show an apparent disagreement about the stress nature. This incongruity between the experimental data can be explained assuming a strong stress field located in the substrate related to defects generated in the silicon during the growth process.
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