4.3 Article

Iodine doping in solid precursor-based CVD growth graphene film

Journal

JOURNAL OF MATERIALS CHEMISTRY
Volume 21, Issue 39, Pages 15209-15213

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c1jm13268g

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Funding

  1. Japan Society for Promotion of Science (JSPS)

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Doping of different elements in intrinsic graphene is of great importance to adjust the electrical and chemical properties for realization of different electronic devices. Here, we demonstrate a simple and controllable synthesis process of iodine-doped graphene film using camphor (C(10)H(16)O), a solid botanical derivative. In situ doping of iodine in a graphene film has many difficulties in a conventional chemical vapor deposition process using a gas source. In this technique, iodine was mixed with the carbon precursor and simultaneously evaporated to pyrolysis on a metal catalytic substrate. Raman and X-ray photoelectron spectroscopic studies confirm the presence of elemental iodine in the form of triiodide and pentaiodide. Simultaneously, evaporated iodine atoms remains within the few-layers graphene structure and interact with carbon atoms through a charge transfer process. This shows a straightforward technique for iodine doping in graphene and a similar approach can be adopted to deposit iodine-doped graphene on other metal substrates.

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