Journal
JOURNAL OF MATERIALS CHEMISTRY
Volume 21, Issue 37, Pages 14150-14155Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c1jm11915j
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Funding
- National Science Foundation [CBET 0933828, OII-0539731]
- Directorate For Engineering
- Div Of Industrial Innovation & Partnersh [822695] Funding Source: National Science Foundation
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [0954202] Funding Source: National Science Foundation
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Optical direct write lithography (ODWL) has the capacity for generating three dimensional arbitrary patterns. Here we examine principles for voxel refinement and relate several techniques for achieving nanoscale resolution. The influence of optics, gelation, and polymerization scaling behavior are expounded, demonstrating the necessity for adopting a multidisciplinary mindset to control both voxel dimensions and minimize out-of-focus reactions. Aspects of two-photon ODWL are reviewed and recent multi-beam ODWL approaches that draw inspiration from STED microscopy are examined.
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