Journal
JOURNAL OF MATERIALS CHEMISTRY
Volume 20, Issue 48, Pages 10924-10930Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c0jm00524j
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Funding
- National Science Council [NSC 96-2112-M-002-038-MY3, NSC 96-2622-M-002-002-CC3]
- Ministry of Education
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Galvanic wet etching was adopted to fabricate Si nanowire arrays (NWAs) as a near-perfect subwavelength structure (SWS), which is an optically effective gradient-index antireflection (AR) surface and also exhibits super-hydrophobicity with an extremely high water contact angle (159 degrees). Fresnel reflection and diffuse reflection over the broad spectrum can be eliminated by a Si NWA AR coating. Moreover, Si NWA SWSs show polarization-independent and omnidirectional AR properties. The wavelength-averaged specular and diffuse reflectance of Si NWA SWSs are as low as 0.06% and 2.51%, respectively. The effects of the surface profile of this biomimetic SWS on the AR and super-hydrophobic properties were investigated systematically.
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