Journal
JOURNAL OF MATERIALS CHEMISTRY
Volume 19, Issue 46, Pages 8767-8771Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/b913466b
Keywords
-
Ask authors/readers for more resources
Five different lithium containing compounds, all representing different chemical systems, were studied in order to deposit lithium containing films by atomic layer deposition ALD. The studied compounds were a lithium beta-diketonate Li(thd) (thd 2,2,6,6-tetramethyl- 3,5-heptanedionate), a lithium alkoxide (LiOBu)-Bu-t ((OBu)-Bu-t = tert-butoxide), a lithium cyclopentadienyl LiCp (Cp cyclopentadienyl), a lithium alkyl n-butyllithium, and a lithium amide lithium dicyclohexylamide. Films containing lithium carbonate (Li2CO3) were obtained from alternate pulsing of Li(thd) and ozone in a temperature range of 185-300 degrees C. The film composition was analyzed by time-of-flight elastic recoil detection analysis (TOF-ERDA). The films grown at 225 degrees C were polycrystalline lithium carbonate as analyzed by X-ray diffraction (XRD). A 120 nm thick lithium carbonate film grown at 225 degrees C had a surface roughness of 19 nm as analyzed by AFM. Lithium lanthanate thin films were grown by combining the Li(thd) process with a ALD process for lanthanum oxide from La(thd) 3 and ozone. The film composition was varied by controlling the number of lithium carbonate and lanthanum oxide sub-cycles. Lithium containing films were also obtained from LiCp and water and from LiOtBu and water.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available