Journal
JOURNAL OF LIGHTWAVE TECHNOLOGY
Volume 30, Issue 15, Pages 2488-2493Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JLT.2012.2200235
Keywords
Chromatic dispersion; coatings; optical waveguides; silicon-on-insulator (SOI) technology; thin films
Funding
- Academy of Finland [129043, 13251210]
- Academy of Finland (AKA) [129043, 129043] Funding Source: Academy of Finland (AKA)
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We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO2 layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances.
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