Journal
JOURNAL OF LIGHTWAVE TECHNOLOGY
Volume 28, Issue 13, Pages 1913-1916Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JLT.2010.2050296
Keywords
Ion radiation effects; optical device fabrication; optical materials; waveguides components
Funding
- National Natural Science Foundation of China [10975094, 10735070]
- National Basic Research Program of China [2010CB832906]
- New Century Excellent Talents of China
- Foundation for the Author of National Excellent Doctoral Dissertation of China
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A new fabrication method for lithium niobate ridge waveguides is reported. Lithium niobate ridge waveguide with a smooth surface was fabricated by O+ ions implanted combined with Ar ion beam etching. The beam propagation method (BPM) was used to simulate the properties of planar and ridge waveguides by use of a reconstructed refractive index profile. The simulation results match to the experimental results very well, and the loss value of the ridge waveguide is about 2 dB/cm.
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