4.7 Article

Degradation of antipyrine by UV, UV/H2O2 and UV/PS

Journal

JOURNAL OF HAZARDOUS MATERIALS
Volume 260, Issue -, Pages 1008-1016

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jhazmat.2013.06.060

Keywords

Antipyrine; Degradation products; Kinetics; Influencing factor

Funding

  1. National Natural Science Foundation of China [51178321]
  2. National Major Project of Science & Technology Ministry of China [2012ZX07403-001]
  3. research and development Project of Ministry of Housing and Urban-Rural Development [2009-K7-4]

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Degradation of antipyrine (AP) in water by three UV-based photolysis processes (i.e., direct UV, UV/H2O2, UV/persulfate (UV/PS)) was studied. For all the oxidation processes, the AP decomposition exhibited a pseudo-first-order kinetics pattern. Generally, UV/H2O2 and UV/PS significantly improved the degradation rate relevant to UV treatment alone. The pseudo-first-order degradation rate constants (k(obs)) were, to different degrees, affected by initial AP concentration, oxidant dose, pH, UV irradiation intensity, and co-existing chemicals such as humic acid, chloride, bicarbonate, carbonate and nitrate. The three oxidation processes followed the order in terms of treatment costs: UV/PS > UV > UV/H2O2 if the energy and chemical costs are considered. Finally, the AP degradation pathways in the UV/H2O2 and UV/PS processes are proposed. Results demonstrated that UV/H2O2 and UV/PS are potential alternatives to control water pollution caused by emerging contaminants such as AP. (C) 2013 Elsevier B.V. All rights reserved.

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