Photodegradation and toxicity changes of antibiotics in UV and UV/H2O2 process

The photodegradation of three antibiotics, oxytetracycline (OTC), doxycycline (DTC), and ciprofloxacin (CIP) in UV and UV/H2O2 process was investigated with a low-pressure UV lamp system. Experiments were performed in buffered ultrapure water (UW), local surface water (SW), and treated water from local municipal drinking water treatment plant (DW) and wastewater treatment plant (WW). The efficiency of UV/H2O2 process was affected by water quality. For all of the three selected antibiotics, the fastest degradation was observed in DW, and the slowest degradation occurred in WW. This phenomenon can be explained by R-OH,R-UV, defined as the experimentally determined (OH)-O-center dot radical exposure per UV fluence. The R-OH,R-UV values represent the background (OH)-O-center dot radical scavenging in water matrix, obtained by the degradation of para-chlorobenzoic acid (pCBA), a probe compound. In natural water, the indirect degradation of CIP did not significantly increase with the addition of H2O2 due to its effective degradation by UV direct photolysis. Moreover, the formation of several photoproducts and oxidation products of antibiotics in UV/H2O2 process was identified using GC-MS. Toxicity assessed by vibrio fischer (V. fischer), was increased in UV photolysis, for the photoproducts still preserving the characteristic structure of the parent compounds. While in UV/H2O2 process, toxicity increased first, and then decreased; nontoxic products were formed by the oxidation of (OH)-O-center dot radical. In this process, detoxification was much easier than mineralization for the tested antibiotics, and the optimal time for the degradation of pollutants in UV/H2O2 process would be determined by parent compound degradation and toxicity changes. (C) 2010 Published by Elsevier B.V.