Journal
OPTICS EXPRESS
Volume 23, Issue 10, Pages 12496-12507Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.23.012496
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Funding
- Department of Energy, Office of Basic Energy Sciences [DE-SC00112704]
- ERC nanosculpture advanced grant [227711]
- US National Science Foundation [DMR-9724294]
- [DE-AC0206CH11357]
- EPSRC [EP/I022562/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/I022562/1] Funding Source: researchfish
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We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy. (C) 2015 Optical Society of America
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