Journal
OPTICAL MATERIALS
Volume 49, Issue -, Pages 51-58Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.optmat.2015.08.021
Keywords
ZnO thin films; RF sputtering; Thermal annealing; Physical properties
Categories
Funding
- University Grants Commission (UGC), New Delhi [42-802/2013(SR)]
- UGC, New Delhi under UGC-BSR [25-1/2013-14(BSR)/7-12 3/2007(BSR)]
- Dr. D.S. Kothari Postdoctoral Fellowship
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This paper presents effect of low temperature annealing on the physical properties of ZnO thin films for photovoltaic applications. The thin films of thickness 50 nm were grown on glass and indium tin oxide (ITO) coated glass substrates employing radio frequency magnetron sputtering technique followed by thermal annealing within low temperature range 150-450 degrees C. These as-grown and annealed films were subjected to the X-ray diffraction (XRD), UV-Vis spectrophotometer, source meter and scanning electron microscopy (SEM) for structural, optical, electrical and surface morphological analysis respectively. The compositional analysis of the as-grown ZnO film was also carried out using energy dispersive spectroscopy (EDS). The XRD patterns reveal that the films have wurtzite structure of hexagonal phase with preferred orientation (100) and polycrystalline in nature. The crystallographic and optical parameters are calculated and discussed in detail. The optical band gap was found in the range 3.30-3.52 eV and observed to decrease with annealing temperature except 150 degrees C. The current-voltage characteristics show that the films exhibit approximately ohmic behavior. The SEM studies show that the films are uniform, homogeneous and free from crystal defects and voids. The experimental results reveal that ZnO thin films may be used as alternative materials for eco-friendly buffer layer to the thin film solar cell applications. (C) 2015 Elsevier B.V. All rights reserved.
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