Journal
JOURNAL OF ELECTRONIC MATERIALS
Volume 43, Issue 9, Pages 3283-3289Publisher
SPRINGER
DOI: 10.1007/s11664-014-3230-2
Keywords
Functionalization; EBID technique; I-V characteristics; photolithography
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Funding
- Department of Information Technology (DIT), Government of India
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In the present work, joining of broken multiwalled carbon nanotubes (MWCNTs) via an electron beam-induced deposition technique is discussed. Current-induced breakdown caused by Joule heating was achieved by applying an appropriate sweep voltage. Scanning electron microscopy images indicated physical joining of broken tubes. To confirm electrical joining of the tubes, current-voltage measurements of the same tube were carried out before and after joining. The current-voltage characteristics remained ohmic after joining of the broken tube. Furthermore, it was found that deposited platinum (Pt) forms ohmic contacts with different shells of MWCNTs after joining, whereas tungsten (W) does not. This approach provides a significant tool for repairing CNTs in interconnect technologies and assembly of three-dimensional (3D) nanostructures.
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