4.5 Article

Analysis of Nonradiative Carrier Recombination Processes in InN Films by Mid-infrared Spectroscopy

Journal

JOURNAL OF ELECTRONIC MATERIALS
Volume 42, Issue 5, Pages 875-881

Publisher

SPRINGER
DOI: 10.1007/s11664-013-2550-y

Keywords

InN; nonradiative recombination; deep states; carrier transport process; thermal activation process

Funding

  1. Grants-in-Aid for Scientific Research [23246056, 13J04851, 25286048] Funding Source: KAKEN

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We investigate the reduction in the efficiency of band-edge radiative recombination in InN by two carrier recombination processes via mid-gap states: radiative recombination via deep states and nonradiative recombination (NR). Because of the small band-gap energy value and the existence of the surface electron accumulation layer, the carrier transition processes via deep states cannot be observed easily. We address this problem by using mid-infrared photoluminescence (PL) measurements, and observe an emission peak around 0.32 eV at room temperature, which we interpret as being caused by transition processes via deep-defect states. Since this emission is weaker than the band-edge emission, the dominant carrier recombination process is concluded to be NR by phonon emission. The NR rate is known to be determined by the NR defect density, carrier transport processes to NR defects, and thermal activation processes of carriers. Carrier transport and capture processes by NR defects are investigated using p-type samples for various carrier mobility values. It is concluded that the NR rate is highly affected by the carrier transport, and that the candidates for the NR defect species are point defects and complexes of acceptor nature. We have also observed the correlation between the thermal conductivity and the band-edge PL intensity. As a result, we have found that the NR rate is highly affected by the carrier transport and thermal activation processes in InN.

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