Journal
JOURNAL OF ELECTRONIC MATERIALS
Volume 40, Issue 3, Pages 301-305Publisher
SPRINGER
DOI: 10.1007/s11664-010-1418-7
Keywords
Laser direct writing; organometallic ink; silver film; polyimide; electrical resistivity
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Funding
- National Scientific Foundation of China [60806035]
- 863 High Technical Project [2007AA030114]
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Laser direct writing of organometallic ink to manufacture silver films was investigated by using a continuous-wave, Yb-doped fiber laser beam at a wavelength of 1071 nm. The organometallic ink consisted of an organometallic silver complex and a carrier vehicle, which was prepared by reaction of silver oxide with ammonium carbamates in methanol. The organometallic silver decomposed at a laser power of 0.1 W. The electrical resistivity values of silver conductors that were fabricated at a laser power of 0.5 W were about four times that of bulk silver. The morphology and electrical properties of the silver film were observed to be controllable as a function of laser processing parameters. The fabricated silver film exhibited excellent adherence to the polyimide substrate surface according to evaluation using the peel-off testing method.
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