Journal
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
Volume 170, Issue 1-3, Pages 13-18Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.elspec.2008.09.003
Keywords
Photoelectron spectroscopy; Photoemission microscopy; X-ray damage
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The beam-induced effects, a consequence of the high photon flux density used in soft X-ray photoelectron emission microscopes in operation at the 3rd generation synchrotron sources, are discussed and illustrated using some representative results obtained with the microscopes at the laboratory Elettra. The focus is on the photon-induced charge potential and chemical degradation, which might be a severe problem for photon-sensible specimens. The possible steps to avoid, reduce or even make use of the beam-induced effects are outlined. (C) 2008 Elsevier B.V. All rights reserved.
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