Journal
JOURNAL OF ELECTROMAGNETIC WAVES AND APPLICATIONS
Volume 23, Issue 1, Pages 87-95Publisher
TAYLOR & FRANCIS LTD
DOI: 10.1163/156939309787604607
Keywords
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Funding
- National Natural Science Foundation of China [90505001]
- High-Tech Research and Development Program of China [2006AA01Z275]
- Creative Research Group Program of UESTC
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A technique is developed for the far field pattern analysis of reflectarrays, which is called 'element-in-array pattern' analysis technique. The technique rigorously takes the effects of mutual coupling between elements and the surrounding array environment into account by extracting the scattered fields of the element aperture in a realistic array configuration. Numerical results validate its accuracy and effectiveness.
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