Journal
JOURNAL OF CRYSTAL GROWTH
Volume 334, Issue 1, Pages 96-102Publisher
ELSEVIER
DOI: 10.1016/j.jcrysgro.2011.08.029
Keywords
Substrates; Molecular beam epitaxy; Bismuth compounds; Topological insulator
Funding
- Research Grant Council of Hong Kong Special Administrative Region [HKU 7061/10P, HKU 10/CRF/08]
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Molecular -beam epitaxy of topological insulator Bi2Se3 on different substrates is carried out, including on clean and hydrogen-terminated Si(111), bismuth (Bi) induced Si(1 1 1)-(root 3 x root 3) and -(3 x 3) surfaces, GaN, and several selenide compounds. Epifilms surface and structural properties are characterized and the effects of surface structure and lattice misfit are indicated. It is found that substrates that are inert to chemical reaction with Bi and/or selenium (Se) and have small lattice misfits with Bi2Se3 appear advantageous to single-crystalline Bi2Se3 film growth. By using vicinal substrates, rotation or twin domains are effectively suppressed. (C) 2011 Elsevier B.V. All rights reserved.
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