4.4 Article

Structural and photoluminescence properties of single-crystalline In2O3 films grown by metal organic vapor deposition

Journal

JOURNAL OF CRYSTAL GROWTH
Volume 310, Issue 18, Pages 4054-4057

Publisher

ELSEVIER
DOI: 10.1016/j.jcrysgro.2008.06.075

Keywords

crystal structure; X-ray diffraction; metal-organic chemical vapor deposition; oxides

Funding

  1. National Natural Science Foundation of China [50672054]

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Single-crystalline In2O3 thin films were obtained on alpha-Al2O3 (0 0 0 1) substrates by the metalorganic chemical vapor deposition (MOCVD) method. The structural, optical and photoluminescence (PL) properties of the In2O3 films were investigated in detail. The sample prepared at 650 degrees C exhibited best crystal quality with body-centered cubic (bcc) structure of pure In2O3. The average transmittance for the films in the visible spectral range exceeded 85%. A single and sharp ultra-violet PL peak near 337 nm was observed at room temperature (RT). The corresponding PL mechanisms were investigated. (C) 2008 Elsevier B.V. All rights reserved.

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