Journal
JOURNAL OF CRYSTAL GROWTH
Volume 310, Issue 18, Pages 4054-4057Publisher
ELSEVIER
DOI: 10.1016/j.jcrysgro.2008.06.075
Keywords
crystal structure; X-ray diffraction; metal-organic chemical vapor deposition; oxides
Funding
- National Natural Science Foundation of China [50672054]
Ask authors/readers for more resources
Single-crystalline In2O3 thin films were obtained on alpha-Al2O3 (0 0 0 1) substrates by the metalorganic chemical vapor deposition (MOCVD) method. The structural, optical and photoluminescence (PL) properties of the In2O3 films were investigated in detail. The sample prepared at 650 degrees C exhibited best crystal quality with body-centered cubic (bcc) structure of pure In2O3. The average transmittance for the films in the visible spectral range exceeded 85%. A single and sharp ultra-violet PL peak near 337 nm was observed at room temperature (RT). The corresponding PL mechanisms were investigated. (C) 2008 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available