Journal
JOURNAL OF CRYSTAL GROWTH
Volume 310, Issue 7-9, Pages 1614-1618Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2007.11.047
Keywords
X-ray diffraction; laser epitaxy; nitride
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Non-polar (1 1 (2) over bar 0) GaN has been successfully grown on (0 0 1) LaAlO3 (LAO) substrate by pulsed laser deposition method. The nitrogen plasma is essential to grow pure a-plane GaN films. The insertion of a ZnO buffer layer improves the quality of GaN thin film as shown by X-ray diffraction. Reflection high energy electron diffraction and cross-sectional transmission electron microscopy with selected area diffraction reveal two types of a-plane GaN domains perpendicular to each other in orientation relationships of [0 0 0 1](GaN)parallel to[1 (1) over bar 0](LAO) and [1 (1) over bar 0 0](GaN)parallel to[1 (1) over bar 0](LAO). (C) 2007 Elsevier B.V. All rights reserved.
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