Journal
JOURNAL OF CATALYSIS
Volume 317, Issue -, Pages 284-292Publisher
ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/j.jcat.2014.07.007
Keywords
Selective hydrogenation; 2-Furfuraldehyde; Furfuryl alcohol; Stability; Copper chromite; TPR; XAFS; ALD; Operando
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Funding
- Institute for Atom-efficient Chemical Transformations (IACT), an Energy Frontier Research Center - U.S. Department of Energy, Office of Science and Office of Basic Energy Sciences
- U.S. Department of Energy, Office of Science, and Office of Basic Energy Sciences [DE-AC02-06CH11357]
- Department of Energy
- MRCAT member institutions
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The stability of a gas-phase furfural hydrogenation catalyst (CuCr2O4 center dot CuO) was enhanced by depositing a thin Al2O3 layer using atomic layer deposition (ALD). Based on temperature-programed reduction (TPR) measurements, the reduction temperature of Cu was raised significantly, and the activation energy for furfural reduction was decreased following the ALD treatment. Thinner ALD layers yielded higher furfural hydrogenation activities. X-ray absorption fine structure (XAFS) spectroscopy studies indicated that Cu1+/Cu-0 are the active species for furfural reduction. (c) 2014 Elsevier Inc. All rights reserved.
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