4.8 Article

Effects of oxygen doping on optical band gap and band edge positions of Ta3N5 photocatalyst: A GGA plus U calculation

Journal

JOURNAL OF CATALYSIS
Volume 309, Issue -, Pages 291-299

Publisher

ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/j.jcat.2013.10.014

Keywords

Oxygen-doped Ta3N5; GGA plus U method; Optical band gaps; Band edge positions; Semiconductor photocatalysis

Funding

  1. National Basic Research Program of China (973 Program) [2013CB632404]
  2. Priority Academic Program Development of Jiangsu Higher Education Institutions [NCET-12-0268]
  3. National Natural Science Foundation of China [51272102, 21073090, 51272101]
  4. Jiangsu Key Laboratory of Atmospheric Environment Monitoring
  5. Nanjing University of Information Science and Technology [kHKAEMPC201102]
  6. Jiangsu Province Innovation Platform for Superiority Subject of Environmental Science and Engineering
  7. High Performance Computing Center (HPCC) of Nanjing University

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Density functional theory calculations with the GGA + U method have been carried out to study the effects of oxygen doping on the optical band gaps and band edge positions of the 0-doped Ta3N5. The results showed that the optical band gaps of 0-doped Ta3N5 were oxygen concentration dependent. With the increase in oxygen concentration, the optical band gap of 0-doped Ta3N5 first decreased and then increased, agreeing well with the experimental observations. The relation between optical band gap and oxygen concentration in 0-doped Ta3N5 can be explained by the competition between Burstein-Moss and band gap narrowing effects, which enlarged and reduced the optical band gap of a semiconductor, respectively. Compared with the pure Ta3N5, doping with oxygen improved The water oxidation ability but lowered the water reduction ability of Ta3N5, suggesting that the impurity oxygen is one proper source that limit the photocatalytic performance of Ta3N5. (C) 2013 Elsevier Inc. All rights reserved.

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