4.6 Article

Study of Gd-doped Bi2Te3 thin films: Molecular beam epitaxy growth and magnetic properties

Journal

JOURNAL OF APPLIED PHYSICS
Volume 115, Issue 2, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4861615

Keywords

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Funding

  1. DARPA MESO [N66001-11-1-4105]
  2. Army Research Laboratories
  3. Department of Defense (DoD) through the National Defense Science & Engineering Graduate Fellowship (NDSEG) Program
  4. Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy [DE-AC02-05CH11231]
  5. John Fell Fund (University of Oxford)
  6. RCaH
  7. EPSRC (UK)
  8. Engineering and Physical Sciences Research Council [1242429] Funding Source: researchfish

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Incorporation of magnetic dopants into topological insulators to break time-reversal symmetry is a prerequisite for observing the quantum anomalous Hall (QAHE) effect and other novel magnetoelectric phenomena. GdBiTe3 with a Gd:Bi ratio of 1:1 is a proposed QAHE system, however, the reported solubility limit for Gd doping into Bi2Te3 bulk crystals is between similar to 0.01 and 0.05. We present a magnetic study of molecular beam epitaxy grown (GdxBi1-x)(2)Te-3 thin films with a high Gd concentration, up to x approximate to 0.3. Magnetometry reveals that the films are paramagnetic down to 1.5 K. X-ray magnetic circular dichroism at the Gd M-4,M-5 edge at 1.5 K reveals a saturation field of similar to 6 T, and a slow decay of the magnetic moment with temperature up to 200 K. The Gd3+ ions, which are substitutional on Bi sites in the Bi2Te3 lattice, exhibit a large atomic moment of similar to 7 mu(B), as determined by bulk-sensitive superconducting quantum interference device magnetometry. Surface oxidation and the formation of Gd2O3 lead to a reduced moment of similar to 4 mu(B) as determined by surface-sensitive x-ray magnetic circular dichroism. Their large atomic moment makes these films suitable for incorporation into heterostructures, where interface polarization effects can lead to the formation of magnetic order within the topological insulators. (C) 2014 AIP Publishing LLC.

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